Initial wafer check
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Revision as of 20:33, 12 January 2012 by 128.111.239.31 (Talk)
Proposed initial wafer checks[edit]
[In brackets the results that should go into the process log are given]
- Microscope check of masks [record irregularities, dirt, etc.]
- Microscope check of wafers [record pits, cracks, etc.]
- AFM on SOI wafer [RMS roughness];
- AFM on III/V wafer [RMS roughness];
- Verify epitaxial layerstack by wet etch and Dektak [Epi layer thicknesses];
- ...
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