Mesa Etching
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Revision as of 21:17, 12 July 2012 by Michael Davenport (Talk | contribs)
This page outlines our effort to improve the III-V mesa etch.
Processing
E-Phi Dev2 SOA mesa definition process:
media:Ephi_Mesa_Etching_v2.xlsx
Processing completed as of July 7/1/12. See Mike with questions or issues.
The mask file is identical to the mesa layer of the taper test mask.
Data
E-Phi Dev2 SOA mesa definition process:
media:Ephi_Mesa_Etching_v2.xlsx
As shown in the above SEMs, etching the SiN layer in ICP, results in smoother sidewalls after the InP etch (when compared to the standard process which uses RIE3). The next step is to compare the sidewalls of this optimized etch process to the InP etch from the Blumenthal and Coldren groups.