Difference between revisions of "Epitaxy layer design"
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Back to [[Process_Hybrid_Silicon]]. | Back to [[Process_Hybrid_Silicon]]. | ||
==Current EPI Structure== | ==Current EPI Structure== | ||
| − | [[ | + | [[Wafer_Table|Epi designs for EPHI shuttle run 1]] |
==Suggestions for revisions== | ==Suggestions for revisions== | ||
[[media:SOA_EPI_DESIGN_v1.pptx|12/16/2011_HSP]] | [[media:SOA_EPI_DESIGN_v1.pptx|12/16/2011_HSP]] | ||
Latest revision as of 15:29, 28 September 2012
Back to Process_Hybrid_Silicon.
Current EPI Structure[edit]
Epi designs for EPHI shuttle run 1
Suggestions for revisions[edit]
01/18/2012 Order Tape Out Form 01/18/2012 Calculation of the epitaxy layer parameters / Epi Design 01/18/2012 Optical Mode Calculation Script/Fimmwave/jaredwave 04/12/2012 Epitaxy layer simulation/Harold
Optical simulation results for the final ordered EPI structures:
Final_SOA-0711281-E (Based on EPump2) Final_SOA-0711281-F (Based on Landmark EPI)
Test report from Vendor:
1545nm LD Epi (0711281-E, based on EPump2) 1545nm LD Epi (0711281-F, based on Landmark EPI)
