Difference between revisions of "DUV Stepper"

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(Characterization)
(Dry Etch)
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[https://docs.google.com/spreadsheet/ccc?key=0Ai_MTssdIAw_dHY4OWRCNjY0V1MzNnFXamhVZWptN3c#gid=0 Process Follower] Google Doc
 
[https://docs.google.com/spreadsheet/ccc?key=0Ai_MTssdIAw_dHY4OWRCNjY0V1MzNnFXamhVZWptN3c#gid=0 Process Follower] Google Doc
  
===Dry Etch===
+
===PR etch rate===
 
{| border="3"
 
{| border="3"
 
|- style="background:green; color:white"
 
|- style="background:green; color:white"
! Etched material !! Equipment !!  Substrate !!Recipe !! Latest etch rate !! Latest update date !! Latest update by !! Calib. file !! Note  
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! PR !! Equipment !!  Substrate !!Recipe !! Latest etch rate !! Latest update date !! Latest update by !! Calib. file !! Note  
 
|-  
 
|-  
| Si || ICP#2 ||SOI ||Bowers si etch # 127 ||4nm/s|| JUN 12, 2010 || Jon Peters || [[media:100402_ICP-2_si_etch_calibration.xls‎|ICP#2 si etch rate]] || 40/20sccm BCl3/Cl2, 500/120W ICP/RF, 2.5Pa
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| UV210 || ICP#2 ||Si ||SiOxVert||140 nm/s|| Nov 5, 2012 || Geza || - || -
 
|-
 
|-
 
|}
 
|}

Revision as of 18:30, 5 November 2012

Characterization

Process Follower Google Doc

PR etch rate

PR Equipment Substrate Recipe Latest etch rate Latest update date Latest update by Calib. file Note
UV210 ICP#2 Si SiOxVert 140 nm/s Nov 5, 2012 Geza - -

Presentations

HP's development for 500 nm WGs, 200 nm coupler gaps (please don't share with people outside Bowers group): Media: 2012_09_11_DUV.pptx

Liftoff process with positive/negative PR (HP's work): Media: 2012_09_28_DUV_Liftoff.pptx

Current Presentation: Media: DUV Stepper Waveguides_v7.pptx

Backup Presentations: DUV Stepper Waveguides Backup Presentations

Pictures

160C Bake

DUV Si 160C_0 SEMs - Gasonics x3 - Dies 26-29: File:160c 8 6 12.zip
DUV Si 160C_0 Microscope Pics - After 20 min Nanostrip: File:Post 20min NanoStrip 8 10 12.zip

170C Bake

DUV Si 170C_0 SEMs - Gasonics x3 - Dies 24-27: File:170c 8 4 12.zip
DUV Si 170C_1 SEMs - PE2 2' + 1165 30' + u/s 10' + PE2 2': File:DUV-si-170C-1.zip
DUV Si 170C_2 Pic - Flood DUV pre-etch + AZ300MIF post-etch: Media:DUV_si_170C_2.jpg
DUV Si 170C_1 SEMs - Sidewall profiles post clean: File:9 7 DUV SOI 170 1 Sidewalls.zip
DUV SOI 170C_1 SEMs - 1165 30' + u/s 10' + PE2 2': File:8 28 DUV SOI 170C 1.zip
DUV SOI 170C_1 SEMs - 1165 30' + u/s 10' + PE2 2': File:8 31 DUV SOI 170C 1.zip
DUV SOI 170C_1 SEMs - ZigZag Grating: File:9 11duvzigzaggrating.zip

180C Bake

DUV Si 180C_0: SEMs - Gasonics x3 - Dies 19-28: File:180c 8 4 12.zip
DUV Si 180C_0: SEMs - Gasonics x3 - Dies 25-29: File:180c 8 6 12.zip


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