Difference between revisions of "Masks"
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[[DUV EPhi-1.2 SOI Passives-2 & Pulsar P,N,SL Layers]] | [[DUV EPhi-1.2 SOI Passives-2 & Pulsar P,N,SL Layers]] | ||
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| + | Sid's TLM mask, single cell: [[File:Metallization_maskv4.gds]]. Plate layout (includes bend loss test, AWG test) [[File:Mask_template.gds]] | ||
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| + | Molly's manual focus/alignment mark only mask (plate layout): [[File:Plate1_noscale.gds]]. Digitized on the file on layer 0 is clear on the mask. | ||
Latest revision as of 13:19, 12 June 2013
Project Masks[edit]
Project mask files and associated process followers/flows are on the device run page
[edit]
DUV EPhi-1.2 SOI Passives-2 & Pulsar P,N,SL Layers
Sid's TLM mask, single cell: File:Metallization maskv4.gds. Plate layout (includes bend loss test, AWG test) File:Mask template.gds
Molly's manual focus/alignment mark only mask (plate layout): File:Plate1 noscale.gds. Digitized on the file on layer 0 is clear on the mask.
