Device Run

This page gives an overview of the various runs. It brings together the information on design, fabrication and characterization. Before, during or immediately after you finish your process run, create a new row and fill in the blanks. Follow the following rules:

• Project can be, e.g., E-Phi, POEM, SWEEPER, etc.;
• Run ID can be anything you want, but pick one and stick to it. If you redo a run, you start a new row in this table and use a new Run ID. Every separate sample in a run needs a separate identifier, which can be indicated in the process log;
• Provide links to the SOI and III/V epi material. We need to know the layerstack, wafernumbers, batch number, etc.;
• Provide an accurate process illustration, e.g., in Powerpoint.
• Upload your process log. For the moment that can be a Word, Excel or Google docs file or a full WIKI page. It's up to you. Just make sure that you have separate files or columns for all samples.
• Give the dates when the processing started and ended.
• A link to a characterization report should be given. Among other things, this report should give at least waveguide loss data, SOA gain data, contact resistance data, etc.

Process Run Table

Project	Run ID	Brief description	Mask set	SOI wafer	III/V wafer	Process illustration	Process log	Processed by	Start date	End date	Status	Results
[project]	[run id]	[description]	[mask set]	[link to SOI data]	[link to III/V epi]	[link to ppt]	[log file]	[name]	[date]	[date]	[status]	[link to report];
[project]	[run id]	[description]	[mask set]	[link to SOI data]	[link to III/V epi]	[link to ppt]	[log file]	[name]	[date]	[date]	[status]	[link to report];
[project]	[run id]	[description]	[mask set]	[link to SOI data]	[link to III/V epi]	[link to ppt]	[log file]	[name]	[date]	[date]	[status]	[link to report];
[project]	[run id]	[description]	[mask set]	[link to SOI data]	[link to III/V epi]	[link to ppt]	[log file]	[name]	[date]	[date]	[status]	[link to report];

Older projects

Project	Name of mask set	Mask file	Mask Polarity and Coordinates	Process follower	Process illustration	Created by	date	Note	Status	Project page
EA modulator	EAM11	download‎	N/A	download‎	download‎	Yongbo	APR, 2012	EAM/Segmented	done	Modulator;
SWEEPER			N/A	download	download	Jon	May, 2011		In progress	SWEEPER;
PhASER	PhASER rev1	download	N/A	download	download	Hui-Wen	JUN, 2008		done
	PhASER rev2	download	download	download	download	Hui-Wen	AUG, 2009	Spiral delay lines	done	PhASER;
Mach-Zehnder modulator	MZM rev2	download	download	download	download	Hui-Wen	APR, 2010	slotline design rev2	done
EA modulator	EAM10	download	N/A	download‎	download	Yongbo	APR, 2010	EAM/TW/Segmented	done	Modulator;
High power MLL	HP-MLL rev1	download	N/A	download	download	Mike	Dec 2010		in progress	High-power MLL;
AWG receiver	AWG receiver rev.1	download	download	download			2009		in progress	AWG Receiver;
Super Lattice			download	download	download	Hui-Wen	Oct, 2009			Superlattice
PULSAR			download	download	download	Jock	2012			Superlattice

Chip table

Run ID	wafer	mask	process flow	process follower	operator	logbook	results
SOIBuffer2R 1							Summary of data.
SOIBuffer2R 2							Grass during mesa etch. New batch started.
SOIBuffer2R 3							Negative PR residue over III-V couldn't be cleaned off. Process follower adjusted.
SOIBuffer2R 4				Process follower			Testing in progress
#1727 W394	Jared design	Lionix	80-nm core
#1727 W395	Jared design	Lionix	80-nm core
Short Loop 2010 06		SOIBuffer2R		Process follower	Geza		Testing in progress