Difference between revisions of "SOI waveguide definition"
From OptoelectronicsWiki
| Line 3: | Line 3: | ||
Single etch depth | Single etch depth | ||
| − | Process follower - [[Si WG etch]] | + | Process follower - [[media:WG.xlsx|Si WG etch]] |
| − | Process flow - [[Si WG etch]] | + | Process flow - [[media:WG.pptx|Si WG etch]] |
==Suggestions for modified process== | ==Suggestions for modified process== | ||
| − | [[Silicon processing.pptx|10282011_HSP]] | + | [[media:Silicon processing.pptx|10282011_HSP]] |
Revision as of 07:56, 28 October 2011
Back to Process_Hybrid_Silicon.
Current Processes
Single etch depth
Process follower - Si WG etch
Process flow - Si WG etch
