Difference between revisions of "DUV Stepper"
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HP's development for 500 nm WGs, 200 nm coupler gaps (please don't share with people outside Bowers group): [[Media: 2012_09_11_DUV.pptx]] | HP's development for 500 nm WGs, 200 nm coupler gaps (please don't share with people outside Bowers group): [[Media: 2012_09_11_DUV.pptx]] | ||
− | Liftoff process with negative PR (HP's work): [[Media: 2012_09_28_DUV_Liftoff.pptx]] | + | Liftoff process with positive/negative PR (HP's work): [[Media: 2012_09_28_DUV_Liftoff.pptx]] |
Current Presentation: [[Media: DUV Stepper Waveguides_v7.pptx]] | Current Presentation: [[Media: DUV Stepper Waveguides_v7.pptx]] |
Revision as of 17:48, 22 October 2012
Contents
Characterization
Process Follower Google Doc
Presentations
HP's development for 500 nm WGs, 200 nm coupler gaps (please don't share with people outside Bowers group): Media: 2012_09_11_DUV.pptx
Liftoff process with positive/negative PR (HP's work): Media: 2012_09_28_DUV_Liftoff.pptx
Current Presentation: Media: DUV Stepper Waveguides_v7.pptx
Backup Presentations: DUV Stepper Waveguides Backup Presentations
Pictures
160C Bake
DUV Si 160C_0 SEMs - Gasonics x3 - Dies 26-29: File:160c 8 6 12.zip DUV Si 160C_0 Microscope Pics - After 20 min Nanostrip: File:Post 20min NanoStrip 8 10 12.zip
170C Bake
DUV Si 170C_0 SEMs - Gasonics x3 - Dies 24-27: File:170c 8 4 12.zip DUV Si 170C_1 SEMs - PE2 2' + 1165 30' + u/s 10' + PE2 2': File:DUV-si-170C-1.zip DUV Si 170C_2 Pic - Flood DUV pre-etch + AZ300MIF post-etch: Media:DUV_si_170C_2.jpg DUV Si 170C_1 SEMs - Sidewall profiles post clean: File:9 7 DUV SOI 170 1 Sidewalls.zip DUV SOI 170C_1 SEMs - 1165 30' + u/s 10' + PE2 2': File:8 28 DUV SOI 170C 1.zip DUV SOI 170C_1 SEMs - 1165 30' + u/s 10' + PE2 2': File:8 31 DUV SOI 170C 1.zip DUV SOI 170C_1 SEMs - ZigZag Grating: File:9 11duvzigzaggrating.zip
180C Bake
DUV Si 180C_0: SEMs - Gasonics x3 - Dies 19-28: File:180c 8 4 12.zip DUV Si 180C_0: SEMs - Gasonics x3 - Dies 25-29: File:180c 8 6 12.zip
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