Si/Ge PD
From OptoelectronicsWiki
Contents
Overview
Gen 1: surface-normal PD
Design
Fabrication
Gen 2: waveguide PD
Design
Fabrication
Fabrication for the waveguide design is composed of two parts: pre-growth Si processing and post-growth processing. The pre-growth processing included n-implant and annealing steps. Since this had not been done by our group before, I did a brief experiment to ensure that the final doping would match the designed doping. A description of this experiment can be found here.
