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• People
  *[[User:Martijn | Martijn Heck]]
  503 B (52 words) - 12:26, 28 June 2012
• Process Hybrid Silicon
  | [[Initial wafer check]] || Jon P., Martijn || style="background:red" |   || - No standard set of test structures
  11 KB (1,553 words) - 17:27, 2 October 2012
• Waiting list
  Current user: Martijn
  1 KB (175 words) - 12:57, 27 April 2011
• OFC transportation
  | 3 || 9AM Monday || 0 || Geza || Daoxin, Martijn, Demis
  1 KB (148 words) - 16:10, 8 March 2011
• Mask Software tools
  ...switch to GDSII format. I have attached the newer version of libmask that Martijn sent out, including a new makefile that makes the GDS (as opposed to CIF) l
  3 KB (516 words) - 20:38, 17 August 2015
• HSP priority list
  * AR (Sudha): Process follower to Jon P. & Martijn (incl. wafer details: who, where, version. etc.) - (Martijn) high risk <br>
  2 KB (318 words) - 14:48, 20 April 2012
• DUV Stepper development
  * Martijn will compile final mask design; Jock will coordinate full mask plate design ...signers (see below) send design (detailed geometry) and proposed splits to Martijn before May 17.
  923 B (138 words) - 12:29, 1 June 2012
• EPHI
  The mask set was designed by Martijn Heck. The process was designed by Mike Davenport and Sudha Srinivasan, wit
  4 KB (638 words) - 16:52, 21 November 2012
• Collective Wisdom
  | On the Modeling of Semiconductor Optical Amplifiers || v1 || Martijn Heck ...by-Pérot fringes in transmission and insertion loss measurements || v1 || Martijn Heck
  2 KB (344 words) - 11:14, 17 January 2013