Difference between revisions of "UCSB E-Phi Runs"
From OptoelectronicsWiki
(Created page with "!!Planned runs for UCSB - E-Phi Component test runs UCSB-E-Phi-test-1 SOI only: test litho and bonding uniformity; UCSB-E-Phi-test-2 III/V lasers and SOAs on SOI; UCSB-E-Phi-tes...") |
(→UCSB-E-Phi-dev-1DUV) |
||
(14 intermediate revisions by 6 users not shown) | |||
Line 1: | Line 1: | ||
− | + | =Planned runs for UCSB - E-Phi= | |
− | Component test runs | + | ==Component test runs== |
− | UCSB-E-Phi- | + | ===UCSB-E-Phi-dev-1=== |
− | SOI only: test litho and bonding uniformity | + | SOI only: test litho and bonding uniformity <br> |
− | + | Planning: | |
− | + | * 12/14 ideas due; | |
− | + | * 01/11 mask review; | |
− | + | * 01/12 mask order sent out; | |
− | + | * 01/21 - 01/30 fabrication. | |
− | + | ====Components and structures==== | |
− | UCSB-E-Phi- | + | [[Media:UCSB-E-Phi-dev-1_SOI_mask_details.pptx]] |
− | + | ||
− | + | ===UCSB-E-Phi-dev-2=== | |
− | UCSB-E-Phi- | + | III/V lasers and SOAs on SOI;<br> |
− | + | Planning: | |
− | + | * 2.17.2012 Concepts for SOA spin due | |
− | III/V | + | * 3.02.2012 Fleshed-out designs for mask inclusion |
− | + | * 3.16.2012 Designs ready for review (i.e. gds files) | |
− | + | * 3.30.2012 Mask tapeout deadline | |
+ | * 4.15.2012 Processing begins | ||
+ | ===[[DUV_Stepper_development|UCSB-E-Phi-dev-1DUV]]=== | ||
+ | SOI only: test litho and novel structures <br> | ||
+ | Planning: | ||
+ | * 04/30 ideas due | ||
+ | * 05/04 mask review | ||
+ | * 05/07 mask order sent out | ||
+ | * 05/10 - 05/24 fabrication | ||
+ | ====Components and structures==== | ||
+ | ===UCSB-E-Phi-dev-3=== | ||
+ | SOI passives coupled to ULLWs; | ||
+ | ===UCSB-E-Phi-dev-4=== | ||
+ | EDWA test run; | ||
+ | ===UCSB-E-Phi-dev-5=== | ||
+ | Isolator test run; | ||
+ | ==Shuttle runs== | ||
+ | ===UCSB-E-Phi-1=== | ||
+ | III/V gain on SOI; | ||
+ | * 03/15 mask design finished; | ||
+ | * 04/31 fabrication finished; | ||
+ | ===UCSB-E-Phi-2=== | ||
+ | III/V gain and ULLWs on SOI; | ||
− | + | ===UCSB-E-Phi-3=== | |
+ | to be decided: either isolators or EDWAs on a III/V on SOI platform. |
Latest revision as of 16:54, 27 April 2012
Planned runs for UCSB - E-Phi[edit]
Component test runs[edit]
UCSB-E-Phi-dev-1[edit]
SOI only: test litho and bonding uniformity
Planning:
- 12/14 ideas due;
- 01/11 mask review;
- 01/12 mask order sent out;
- 01/21 - 01/30 fabrication.
Components and structures[edit]
Media:UCSB-E-Phi-dev-1_SOI_mask_details.pptx
UCSB-E-Phi-dev-2[edit]
III/V lasers and SOAs on SOI;
Planning:
- 2.17.2012 Concepts for SOA spin due
- 3.02.2012 Fleshed-out designs for mask inclusion
- 3.16.2012 Designs ready for review (i.e. gds files)
- 3.30.2012 Mask tapeout deadline
- 4.15.2012 Processing begins
UCSB-E-Phi-dev-1DUV[edit]
SOI only: test litho and novel structures
Planning:
- 04/30 ideas due
- 05/04 mask review
- 05/07 mask order sent out
- 05/10 - 05/24 fabrication
Components and structures[edit]
UCSB-E-Phi-dev-3[edit]
SOI passives coupled to ULLWs;
UCSB-E-Phi-dev-4[edit]
EDWA test run;
UCSB-E-Phi-dev-5[edit]
Isolator test run;
Shuttle runs[edit]
UCSB-E-Phi-1[edit]
III/V gain on SOI;
- 03/15 mask design finished;
- 04/31 fabrication finished;
UCSB-E-Phi-2[edit]
III/V gain and ULLWs on SOI;
UCSB-E-Phi-3[edit]
to be decided: either isolators or EDWAs on a III/V on SOI platform.