Difference between revisions of "UCSB E-Phi Runs"

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(UCSB-E-Phi-dev-1DUV)
 
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==Component test runs==
 
==Component test runs==
===UCSB-E-Phi-test-1===
+
===UCSB-E-Phi-dev-1===
 
SOI only: test litho and bonding uniformity <br>
 
SOI only: test litho and bonding uniformity <br>
 
Planning:
 
Planning:
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* 01/21 - 01/30 fabrication.
 
* 01/21 - 01/30 fabrication.
 
====Components and structures====
 
====Components and structures====
* Bonding test structures
+
[[Media:UCSB-E-Phi-dev-1_SOI_mask_details.pptx]]
** Patterns for bonding [Di, Martijn]
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* SOI waveguide test structures
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** Resolution markers, Taper tip test structure [Sudha]
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** Loss test structures [Martijn]
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* SOI component test structures
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** MMIs [Martijn, Yongbo]
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** Bends [Martijn]
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** Offsets [Martijn]
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** 10-GHz and 20-GHz ring filters/oscillators [Martijn]
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* Other ideas
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** WG crossing [Sid]
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** Silicon nanowire tapers [Jock]
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** Taper from 0.8um to 2.0um, change taper length/shape [Sid, Geza]
+
  
===UCSB-E-Phi-test-2===
+
===UCSB-E-Phi-dev-2===
III/V lasers and SOAs on SOI;
+
III/V lasers and SOAs on SOI;<br>
 
Planning:
 
Planning:
* 01/31 mask design finished;
+
* 2.17.2012  Concepts for SOA spin due
* 02/29 fabrication finished;
+
* 3.02.2012  Fleshed-out designs for mask inclusion
 +
* 3.16.2012  Designs ready for review (i.e. gds files)
 +
* 3.30.2012  Mask tapeout deadline
 +
* 4.15.2012  Processing begins
  
===UCSB-E-Phi-test-3===
+
===[[DUV_Stepper_development|UCSB-E-Phi-dev-1DUV]]===
 +
SOI only: test litho and novel structures <br>
 +
Planning:
 +
* 04/30 ideas due
 +
* 05/04 mask review
 +
* 05/07 mask order sent out
 +
* 05/10 - 05/24 fabrication
 +
====Components and structures====
 +
 
 +
===UCSB-E-Phi-dev-3===
 
SOI passives coupled to ULLWs;
 
SOI passives coupled to ULLWs;
  
===UCSB-E-Phi-test-4===
+
===UCSB-E-Phi-dev-4===
 
EDWA test run;
 
EDWA test run;
  
===UCSB-E-Phi-test-5===
+
===UCSB-E-Phi-dev-5===
 
Isolator test run;
 
Isolator test run;
  

Latest revision as of 16:54, 27 April 2012

Planned runs for UCSB - E-Phi[edit]

Component test runs[edit]

UCSB-E-Phi-dev-1[edit]

SOI only: test litho and bonding uniformity
Planning:

  • 12/14 ideas due;
  • 01/11 mask review;
  • 01/12 mask order sent out;
  • 01/21 - 01/30 fabrication.

Components and structures[edit]

Media:UCSB-E-Phi-dev-1_SOI_mask_details.pptx

UCSB-E-Phi-dev-2[edit]

III/V lasers and SOAs on SOI;
Planning:

  • 2.17.2012 Concepts for SOA spin due
  • 3.02.2012 Fleshed-out designs for mask inclusion
  • 3.16.2012 Designs ready for review (i.e. gds files)
  • 3.30.2012 Mask tapeout deadline
  • 4.15.2012 Processing begins

UCSB-E-Phi-dev-1DUV[edit]

SOI only: test litho and novel structures
Planning:

  • 04/30 ideas due
  • 05/04 mask review
  • 05/07 mask order sent out
  • 05/10 - 05/24 fabrication

Components and structures[edit]

UCSB-E-Phi-dev-3[edit]

SOI passives coupled to ULLWs;

UCSB-E-Phi-dev-4[edit]

EDWA test run;

UCSB-E-Phi-dev-5[edit]

Isolator test run;

Shuttle runs[edit]

UCSB-E-Phi-1[edit]

III/V gain on SOI;

  • 03/15 mask design finished;
  • 04/31 fabrication finished;

UCSB-E-Phi-2[edit]

III/V gain and ULLWs on SOI;

UCSB-E-Phi-3[edit]

to be decided: either isolators or EDWAs on a III/V on SOI platform.