Difference between revisions of "UCSB E-Phi Runs"

From OptoelectronicsWiki
Jump to: navigation, search
(Component test runs)
(UCSB-E-Phi-dev-1DUV)
 
(2 intermediate revisions by 2 users not shown)
Line 10: Line 10:
 
* 01/21 - 01/30 fabrication.
 
* 01/21 - 01/30 fabrication.
 
====Components and structures====
 
====Components and structures====
[[Media::UCSB-E-Phi-dev-1_SOI_mask_details.pptx]]
+
[[Media:UCSB-E-Phi-dev-1_SOI_mask_details.pptx]]
  
 
===UCSB-E-Phi-dev-2===
 
===UCSB-E-Phi-dev-2===
Line 21: Line 21:
 
* 4.15.2012  Processing begins
 
* 4.15.2012  Processing begins
  
===UCSB-E-Phi-dev-1DUV===
+
===[[DUV_Stepper_development|UCSB-E-Phi-dev-1DUV]]===
SOI only: test litho and bonding uniformity <br>
+
SOI only: test litho and novel structures <br>
 
Planning:
 
Planning:
* 04/20 ideas due;
+
* 04/30 ideas due
* 04/24 mask review;
+
* 05/04 mask review
* 04/26 mask order sent out;
+
* 05/07 mask order sent out
* 05/01 - 05/11 fabrication.
+
* 05/10 - 05/24 fabrication
 
====Components and structures====
 
====Components and structures====
 
 
  
 
===UCSB-E-Phi-dev-3===
 
===UCSB-E-Phi-dev-3===

Latest revision as of 16:54, 27 April 2012

Planned runs for UCSB - E-Phi[edit]

Component test runs[edit]

UCSB-E-Phi-dev-1[edit]

SOI only: test litho and bonding uniformity
Planning:

  • 12/14 ideas due;
  • 01/11 mask review;
  • 01/12 mask order sent out;
  • 01/21 - 01/30 fabrication.

Components and structures[edit]

Media:UCSB-E-Phi-dev-1_SOI_mask_details.pptx

UCSB-E-Phi-dev-2[edit]

III/V lasers and SOAs on SOI;
Planning:

  • 2.17.2012 Concepts for SOA spin due
  • 3.02.2012 Fleshed-out designs for mask inclusion
  • 3.16.2012 Designs ready for review (i.e. gds files)
  • 3.30.2012 Mask tapeout deadline
  • 4.15.2012 Processing begins

UCSB-E-Phi-dev-1DUV[edit]

SOI only: test litho and novel structures
Planning:

  • 04/30 ideas due
  • 05/04 mask review
  • 05/07 mask order sent out
  • 05/10 - 05/24 fabrication

Components and structures[edit]

UCSB-E-Phi-dev-3[edit]

SOI passives coupled to ULLWs;

UCSB-E-Phi-dev-4[edit]

EDWA test run;

UCSB-E-Phi-dev-5[edit]

Isolator test run;

Shuttle runs[edit]

UCSB-E-Phi-1[edit]

III/V gain on SOI;

  • 03/15 mask design finished;
  • 04/31 fabrication finished;

UCSB-E-Phi-2[edit]

III/V gain and ULLWs on SOI;

UCSB-E-Phi-3[edit]

to be decided: either isolators or EDWAs on a III/V on SOI platform.