Difference between revisions of "UCSB E-Phi Runs"

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(Created page with "!!Planned runs for UCSB - E-Phi Component test runs UCSB-E-Phi-test-1 SOI only: test litho and bonding uniformity; UCSB-E-Phi-test-2 III/V lasers and SOAs on SOI; UCSB-E-Phi-tes...")
 
(UCSB-E-Phi-dev-1DUV)
 
(14 intermediate revisions by 6 users not shown)
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!!Planned runs for UCSB - E-Phi
+
=Planned runs for UCSB - E-Phi=
  
Component test runs
+
==Component test runs==
UCSB-E-Phi-test-1
+
===UCSB-E-Phi-dev-1===
SOI only: test litho and bonding uniformity;
+
SOI only: test litho and bonding uniformity <br>
UCSB-E-Phi-test-2
+
Planning:
III/V lasers and SOAs on SOI;
+
* 12/14 ideas due;
UCSB-E-Phi-test-3
+
* 01/11 mask review;
SOI passives coupled to ULLWs;
+
* 01/12 mask order sent out;
UCSB-E-Phi-test-4
+
* 01/21 - 01/30 fabrication.
EDWA test run;
+
====Components and structures====
UCSB-E-Phi-test-5
+
[[Media:UCSB-E-Phi-dev-1_SOI_mask_details.pptx]]
Isolator test run;
+
  
Shuttle runs
+
===UCSB-E-Phi-dev-2===
UCSB-E-Phi-1
+
III/V lasers and SOAs on SOI;<br>
III/V gain on SOI;
+
Planning:
UCSB-E-Phi-2
+
* 2.17.2012  Concepts for SOA spin due
III/V gain and ULLWs on SOI;
+
* 3.02.2012  Fleshed-out designs for mask inclusion
UCSB-E-Phi-3
+
* 3.16.2012  Designs ready for review (i.e. gds files)
to be decided: either isolators or EDWAs on a III/V on SOI platform.
+
* 3.30.2012  Mask tapeout deadline
 +
* 4.15.2012  Processing begins
  
 +
===[[DUV_Stepper_development|UCSB-E-Phi-dev-1DUV]]===
 +
SOI only: test litho and novel structures <br>
 +
Planning:
 +
* 04/30 ideas due
 +
* 05/04 mask review
 +
* 05/07 mask order sent out
 +
* 05/10 - 05/24 fabrication
 +
====Components and structures====
  
 +
===UCSB-E-Phi-dev-3===
 +
SOI passives coupled to ULLWs;
  
 +
===UCSB-E-Phi-dev-4===
 +
EDWA test run;
  
 +
===UCSB-E-Phi-dev-5===
 +
Isolator test run;
  
 +
==Shuttle runs==
 +
===UCSB-E-Phi-1===
 +
III/V gain on SOI;
 +
* 03/15 mask design finished;
 +
* 04/31 fabrication finished;
  
 +
===UCSB-E-Phi-2===
 +
III/V gain and ULLWs on SOI;
  
ideas due 12/14, mask review 12/20
+
===UCSB-E-Phi-3===
 +
to be decided: either isolators or EDWAs on a III/V on SOI platform.

Latest revision as of 16:54, 27 April 2012

Planned runs for UCSB - E-Phi[edit]

Component test runs[edit]

UCSB-E-Phi-dev-1[edit]

SOI only: test litho and bonding uniformity
Planning:

  • 12/14 ideas due;
  • 01/11 mask review;
  • 01/12 mask order sent out;
  • 01/21 - 01/30 fabrication.

Components and structures[edit]

Media:UCSB-E-Phi-dev-1_SOI_mask_details.pptx

UCSB-E-Phi-dev-2[edit]

III/V lasers and SOAs on SOI;
Planning:

  • 2.17.2012 Concepts for SOA spin due
  • 3.02.2012 Fleshed-out designs for mask inclusion
  • 3.16.2012 Designs ready for review (i.e. gds files)
  • 3.30.2012 Mask tapeout deadline
  • 4.15.2012 Processing begins

UCSB-E-Phi-dev-1DUV[edit]

SOI only: test litho and novel structures
Planning:

  • 04/30 ideas due
  • 05/04 mask review
  • 05/07 mask order sent out
  • 05/10 - 05/24 fabrication

Components and structures[edit]

UCSB-E-Phi-dev-3[edit]

SOI passives coupled to ULLWs;

UCSB-E-Phi-dev-4[edit]

EDWA test run;

UCSB-E-Phi-dev-5[edit]

Isolator test run;

Shuttle runs[edit]

UCSB-E-Phi-1[edit]

III/V gain on SOI;

  • 03/15 mask design finished;
  • 04/31 fabrication finished;

UCSB-E-Phi-2[edit]

III/V gain and ULLWs on SOI;

UCSB-E-Phi-3[edit]

to be decided: either isolators or EDWAs on a III/V on SOI platform.