Difference between revisions of "SWEEPER"

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(Characterization)
(Characterization)
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P-Dope 2 Litho - Implant 3C - Pics - Sample 3 & 4: [[File:implant3C_litho.zip]]
 
P-Dope 2 Litho - Implant 3C - Pics - Sample 3 & 4: [[File:implant3C_litho.zip]]
  
Post Implant 3B PR Strip (mostly stripped): [[File:Cracking_Pics_post_3C_Strip_.jpg]]
+
Post Implant 3B PR Strip (mostly stripped): [[File:Cracking_Pics_post_3C_Strip_1.jpg]]
  
 
<u><b>PASSIVES RUN</b></u>  <br>
 
<u><b>PASSIVES RUN</b></u>  <br>
 
Passive grating results:  [[File:sweeper_Q2.doc]] <br>
 
Passive grating results:  [[File:sweeper_Q2.doc]] <br>
 
2D beam steering results, OFC video: [[File:OFC_Doylend_vid2.zip]]
 
2D beam steering results, OFC video: [[File:OFC_Doylend_vid2.zip]]

Revision as of 16:35, 6 August 2012

Overview

SWEEPER, formally known as "Chip-scale Integrated Photonic Phased Array" (CHIPPA) aims to produce a phased array of waveguide-coupled surface gratings integrated with an on-chip tunable laser, amplifiers, and phase modulators for free-space beam control in 2 axes.

Simulations

Run 2 current injection modulator:

Processing

RUN 3.1 (active Silicon only for fast phase modulator tests)
Current Traveler for ACTIVES Run 3 - Phase modulator run: Media:SWEEPER Actives Trav v21_2b ACTIVE SI ONLY.docx <-- note the new dopant anneal recipe: 5mins instead of 10.
Old Traveler for ACTIVES Run 3 - Phase modulator run: Media:SWEEPER Actives Trav v21_1 ACTIVE SI ONLY.docx

Powerpoint overview (trav 21_2): Media:process flow SWEEPER RUN3_1 trav v21_2.pptx

Planned schedule for ACTIVES Run 3 - Phase modulator run: aSi-PM Process Schedule

Mask set: Media:SWEEPER 3_1 - aSi Shortloop v12.zip

Chip status is maintained on a google doc: Google doc traveller

Current Anneal Recipes for ACTIVES Run 1:: Media:Sweeper_Anneal_Recipe.xlsx‎

RUN 2.3 (hybrid Silicon only for Phase 1 tunable lasers test)
Traveler used for ACTIVES Run 1A (hybrid silicon only - no active silicon): Media:SWEEPER Actives Trav vH20_2_HYBRID-ONLY.docx

RUN 2.2 (both active and hybrid Silicon for Phase 1 PIC)
Traveler used for ACTIVES Run 1 (full process, chips A-E, produced chips A2, E1, E2): Media:SWEEPER Actives Trav v20_1.docx

RUN 2.1 (active Silicon for Phase 1 intermediate testing)
Prior traveler for ACTIVES Run 1 (active Si only): Media:SWEEPER Actives Trav v15_3.xls


RUN 1.2(spring/summer 2011 - passive SWEEPER for Phase 1 with revisions to avoid grating damage)
Traveler for Run 2B: Media:110202 Sweeper Rev1.1 Run 2B.xls

RUN 1.1(early spring 2011 - passive SWEEPER for Phase 1)
Traveler for Run 1: Media:110202_Sweeper_Rev1_Batch_1.xls

Powerpoint overview can be found here Media:SWEEPER_process_flow.pptx

Prelim mask:

File:SWEEPER ACTIVES55 semifinal flat2.cif

File:SWEEPER ACTIVES59 semifinal flat2.cif

Grating Reports:

Media:Sweeper_Run_2B_-_GratingReport-2.pptx

Characterization

aSI PHASE MODULATOR RUN
Group A

Rib litho pics before hard mask etch: File:Rib litho pics.zip

Rib Pics before Si Etch - Dummy 1: File:Dummy post pr strip pre rib etch.zip

Rib Pics before Si Etch - Sample 1: File:Sample1 pre si etch.zip

Rib Pics before Si Etch - Sample 2: File:Sample2 pre si etch.zip

Rib Pics post Si Etch - Sample 2: File:Sample2 post si etch.zip

Group B

SEM post Si Etch - Dummy 2: File:Sample2 SEM post si etch.zip

N-Dope Litho -Implant 3A - Pics - Sample 3 & 4: File:Ndopelithopics.zip

Post Implant 3A PR Strip - Pics - Sample 3 & 4: File:Post imp3A PR strip.zip

P-Dope 1 Litho -Implant 3B - Pics - Sample 3 & 4: File:Implant3B litho.zip

Post Implant 3B PR Strip: Media:post_imp3B_PR_strip.jpg

P-Dope 2 Litho - Implant 3C - Pics - Sample 3 & 4: File:Implant3C litho.zip

Post Implant 3B PR Strip (mostly stripped): File:Cracking Pics post 3C Strip 1.jpg

PASSIVES RUN
Passive grating results: File:Sweeper Q2.doc
2D beam steering results, OFC video: File:OFC Doylend vid2.zip