Difference between revisions of "SOI waveguide definition"

Revision as of 08:05, 17 February 2012

Single etch depth

Process follower - Si WG etch

Process flow - Si WG etch

Revision as of 08:04, 17 February 2012 (edit) Sudharsanan (Talk \| contribs) ← Older edit		Revision as of 08:05, 17 February 2012 (edit) (undo) Sudharsanan (Talk \| contribs) Newer edit →
Line 16:		Line 16:
	[[media:Silicon processing03.pptx\|01132012_HSP]]		[[media:Silicon processing03.pptx\|01132012_HSP]]

−	[[~~media:Silicon processing04.pptx\|~~02172012_HSP]]	+	[[02172012_HSP]]