Difference between revisions of "SOI waveguide definition"
From OptoelectronicsWiki
(Created page with "...") |
Sudharsanan (Talk | contribs) |
||
| (18 intermediate revisions by 3 users not shown) | |||
| Line 1: | Line 1: | ||
| − | ... | + | Back to [[Process_Hybrid_Silicon]]. |
| + | ==Current Processes== | ||
| + | Single etch depth | ||
| + | |||
| + | Process follower - [[media:WG.xlsx|Si WG etch]] | ||
| + | |||
| + | Process flow - [[media:WG.pptx|Si WG etch]] | ||
| + | |||
| + | ==Suggestions for modified process== | ||
| + | [[media:Silicon processing.pptx|10282011_HSP]] | ||
| + | |||
| + | [[media:Silicon processing01.pptx|12022011_HSP]] | ||
| + | |||
| + | [[media:Silicon processing02.pptx|12092011_HSP]] | ||
| + | |||
| + | [[media:Silicon processing03.pptx|01132012_HSP]] | ||
| + | |||
| + | [[media:Silicon processing4.pptx|02172012_HSP]] | ||
Latest revision as of 08:07, 17 February 2012
Back to Process_Hybrid_Silicon.
Current Processes[edit]
Single etch depth
Process follower - Si WG etch
Process flow - Si WG etch
