Difference between revisions of "SOI waveguide definition"
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Single etch depth | Single etch depth | ||
| − | Process follower - [[Si WG etch]] | + | Process follower - [[media:WG.xlsx|Si WG etch]] |
| − | Process flow - [[Si WG etch]] | + | Process flow - [[media:WG.pptx|Si WG etch]] |
==Suggestions for modified process== | ==Suggestions for modified process== | ||
| − | [[Silicon processing.pptx|10282011_HSP]] | + | [[media:Silicon processing.pptx|10282011_HSP]] |
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| + | [[media:Silicon processing01.pptx|12022011_HSP]] | ||
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| + | [[media:Silicon processing02.pptx|12092011_HSP]] | ||
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| + | [[media:Silicon processing03.pptx|01132012_HSP]] | ||
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| + | [[media:Silicon processing4.pptx|02172012_HSP]] | ||
Latest revision as of 08:07, 17 February 2012
Back to Process_Hybrid_Silicon.
Current Processes[edit]
Single etch depth
Process follower - Si WG etch
Process flow - Si WG etch
