Difference between revisions of "SOI waveguide definition"
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Back to [[Process_Hybrid_Silicon]]. | Back to [[Process_Hybrid_Silicon]]. | ||
==Current Processes== | ==Current Processes== | ||
+ | Single etch depth | ||
+ | |||
+ | Process follower - [[media:WG.xlsx|Si WG etch]] | ||
+ | |||
+ | Process flow - [[media:WG.pptx|Si WG etch]] | ||
+ | |||
+ | ==Suggestions for modified process== | ||
+ | [[media:Silicon processing.pptx|10282011_HSP]] | ||
+ | |||
+ | [[media:Silicon processing01.pptx|12022011_HSP]] | ||
+ | |||
+ | [[media:Silicon processing02.pptx|12092011_HSP]] | ||
+ | |||
+ | [[media:Silicon processing03.pptx|01132012_HSP]] | ||
+ | |||
+ | [[media:Silicon processing4.pptx|02172012_HSP]] |
Latest revision as of 08:07, 17 February 2012
Back to Process_Hybrid_Silicon.
Current Processes[edit]
Single etch depth
Process follower - Si WG etch
Process flow - Si WG etch