Difference between revisions of "Device Run"
From OptoelectronicsWiki
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|'''Super Lattice''' || || || [[media:Layout Information Template.xlsx|download]] || [[media:091211_recipe_SL_batch1.xls|download]] || [[media:091211_SL_process flow.ppt|download]] || Hui-Wen || Oct, 2009 || || || [[Superlattice|Superlattice]] | |'''Super Lattice''' || || || [[media:Layout Information Template.xlsx|download]] || [[media:091211_recipe_SL_batch1.xls|download]] || [[media:091211_SL_process flow.ppt|download]] || Hui-Wen || Oct, 2009 || || || [[Superlattice|Superlattice]] | ||
|- | |- | ||
+ | |||
+ | |} | ||
+ | |||
+ | |||
+ | |||
+ | {| border="3" | ||
+ | |+ '''Chip table''' | ||
+ | |- style="background:red; color:white" | ||
+ | ! Run ID !! wafer !! mask !! process flow !! process follower !! operator !! logbook !! results | ||
+ | |- | ||
+ | | SOIBuffer2R 1 || || || || || || || [[media:SOIBuffer2RBatch1.pptx | Summary of data.]] | ||
+ | |- | ||
+ | | SOIBuffer2R 2 || || || || || || || Grass during mesa etch. New batch started. | ||
+ | |- | ||
+ | | SOIBuffer2R 3 || || || || || || || Negative PR residue over III-V couldn't be cleaned off. Process follower adjusted. | ||
+ | |- | ||
+ | | SOIBuffer2R 4 || || || || [[media:SOIBuffer2R_v2.6.docx | Process follower]] || || || Testing in progress | ||
+ | |- | ||
+ | | #1727 W394 || Jared design || Lionix || 80-nm core || || || || | ||
+ | |- | ||
+ | | #1727 W395 || Jared design || Lionix || 80-nm core || || || || | ||
+ | |- | ||
+ | | Short Loop 2010 06 || || SOIBuffer2R || || [[media:WG.xlsx | Process follower]] || Geza || || Testing in progress | ||
+ | |- | ||
+ | |||
+ | |||
+ | |||
|} | |} |
Revision as of 14:34, 9 May 2011
- Please contribute your mask layout and process follower here.
- This page is used to help everyone get track of the mask sets and related process files.
Project | Name of mask set | Mask file | Mask Polarity and Coordinates | Process follower | Process illustration | Created by | date | Note | Status | Project page |
---|---|---|---|---|---|---|---|---|---|---|
SWEEPER | N/A | download | download | Jon | May, 2011 | In progress | SWEEPER; | |||
PhASER | PhASER rev1 | download | N/A | download | download | Hui-Wen | JUN, 2008 | done | ||
PhASER rev2 | download | download | download | download | Hui-Wen | AUG, 2009 | Spiral delay lines | done | PhASER; | |
Mach-Zehnder modulator | MZM rev2 | download | download | download | download | Hui-Wen | APR, 2010 | slotline design rev2 | done | |
High power MLL | HP-MLL rev1 | download | N/A | download | download | Mike | Dec 2010 | in progress | High-power MLL; | |
AWG receiver | AWG receiver rev.1 | download | download | download | 2009 | in progress | AWG Receiver; | |||
Super Lattice | download | download | download | Hui-Wen | Oct, 2009 | Superlattice |
Run ID | wafer | mask | process flow | process follower | operator | logbook | results |
---|---|---|---|---|---|---|---|
SOIBuffer2R 1 | Summary of data. | ||||||
SOIBuffer2R 2 | Grass during mesa etch. New batch started. | ||||||
SOIBuffer2R 3 | Negative PR residue over III-V couldn't be cleaned off. Process follower adjusted. | ||||||
SOIBuffer2R 4 | Process follower | Testing in progress | |||||
#1727 W394 | Jared design | Lionix | 80-nm core | ||||
#1727 W395 | Jared design | Lionix | 80-nm core | ||||
Short Loop 2010 06 | SOIBuffer2R | Process follower | Geza | Testing in progress |