Difference between revisions of "Device Run"

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* Please contribute your mask layout and process follower here.
 
* Please contribute your mask layout and process follower here.
 
* This page is used to help everyone get track of the mask sets and related process files.
 
* This page is used to help everyone get track of the mask sets and related process files.
 +
* Note there are two tables
  
  

Revision as of 14:37, 9 May 2011

  • Please contribute your mask layout and process follower here.
  • This page is used to help everyone get track of the mask sets and related process files.
  • Note there are two tables


Project Name of mask set Mask file Mask Polarity and Coordinates Process follower Process illustration Created by date Note Status Project page
SWEEPER     N/A download download Jon May, 2011   In progress SWEEPER;
PhASER PhASER rev1 download N/A download download Hui-Wen JUN, 2008   done  
  PhASER rev2 download download download download Hui-Wen AUG, 2009 Spiral delay lines done PhASER;
Mach-Zehnder modulator MZM rev2 download download download download Hui-Wen APR, 2010 slotline design rev2 done  
High power MLL HP-MLL rev1 download N/A download download Mike Dec 2010   in progress High-power MLL;
AWG receiver AWG receiver rev.1 download download download     2009   in progress AWG Receiver;
Super Lattice     download download download Hui-Wen Oct, 2009     Superlattice


Chip table
Run ID wafer mask process flow process follower operator logbook results
SOIBuffer2R 1             Summary of data.
SOIBuffer2R 2             Grass during mesa etch. New batch started.
SOIBuffer2R 3             Negative PR residue over III-V couldn't be cleaned off. Process follower adjusted.
SOIBuffer2R 4       Process follower     Testing in progress
#1727 W394 Jared design Lionix 80-nm core        
#1727 W395 Jared design Lionix 80-nm core        
Short Loop 2010 06   SOIBuffer2R   Process follower Geza   Testing in progress