Difference between revisions of "Device Run"
From OptoelectronicsWiki
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| '''Mach-Zehnder modulator''' || MZM rev2 || [[media:100309_slotline_G2_tapeout.tdb|download]] ||[[media:100309_Stepper_coordinates_and_GDS_number.xls|download]] ||[[media:100401_Slotline_rev2.xls|download]] || [[media:100122_slotline_process_flow.ppt|download]] || Hui-Wen ||APR, 2010|| slotline design rev2 || done || | | '''Mach-Zehnder modulator''' || MZM rev2 || [[media:100309_slotline_G2_tapeout.tdb|download]] ||[[media:100309_Stepper_coordinates_and_GDS_number.xls|download]] ||[[media:100401_Slotline_rev2.xls|download]] || [[media:100122_slotline_process_flow.ppt|download]] || Hui-Wen ||APR, 2010|| slotline design rev2 || done || | ||
| + | |- | ||
| + | | '''EA modulator''' || EAM10 || [[Media: EAM10_Mask.zip]] ||[[Media:EAM10_process.xls]] ||[[media:100401_Slotline_rev2.xls|download]] || [[Media:EAM10_process.pptx]] || Yongbo ||APR, 2010|| EAM/TW/Segmented || done || | ||
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|'''High power MLL''' || HP-MLL rev1 || [[media:HP_MLL_Ledit_v11_rev_5-10by_Mike_in_Ledit_11.zip|download]] || N/A || [[media:20110112_HP-MLL_process_follower.docx |download]] || [[media:HP_MLL_Process_flow_of_October_25.pptx|download]] || Mike || Dec 2010 || || in progress || [[High-power_MLL|High-power MLL]]; | |'''High power MLL''' || HP-MLL rev1 || [[media:HP_MLL_Ledit_v11_rev_5-10by_Mike_in_Ledit_11.zip|download]] || N/A || [[media:20110112_HP-MLL_process_follower.docx |download]] || [[media:HP_MLL_Process_flow_of_October_25.pptx|download]] || Mike || Dec 2010 || || in progress || [[High-power_MLL|High-power MLL]]; | ||
Revision as of 18:50, 11 May 2011
- Please contribute your mask layout and process follower here.
- This page is used to help everyone get track of the mask sets and related process files.
- Note there are two tables
| Project | Name of mask set | Mask file | Mask Polarity and Coordinates | Process follower | Process illustration | Created by | date | Note | Status | Project page |
|---|---|---|---|---|---|---|---|---|---|---|
| SWEEPER | N/A | download | download | Jon | May, 2011 | In progress | SWEEPER; | |||
| PhASER | PhASER rev1 | download | N/A | download | download | Hui-Wen | JUN, 2008 | done | ||
| PhASER rev2 | download | download | download | download | Hui-Wen | AUG, 2009 | Spiral delay lines | done | PhASER; | |
| Mach-Zehnder modulator | MZM rev2 | download | download | download | download | Hui-Wen | APR, 2010 | slotline design rev2 | done | |
| EA modulator | EAM10 | Media: EAM10_Mask.zip | Media:EAM10_process.xls | download | Media:EAM10_process.pptx | Yongbo | APR, 2010 | EAM/TW/Segmented | done | |
| High power MLL | HP-MLL rev1 | download | N/A | download | download | Mike | Dec 2010 | in progress | High-power MLL; | |
| AWG receiver | AWG receiver rev.1 | download | download | download | 2009 | in progress | AWG Receiver; | |||
| Super Lattice | download | download | download | Hui-Wen | Oct, 2009 | Superlattice |
| Run ID | wafer | mask | process flow | process follower | operator | logbook | results |
|---|---|---|---|---|---|---|---|
| SOIBuffer2R 1 | Summary of data. | ||||||
| SOIBuffer2R 2 | Grass during mesa etch. New batch started. | ||||||
| SOIBuffer2R 3 | Negative PR residue over III-V couldn't be cleaned off. Process follower adjusted. | ||||||
| SOIBuffer2R 4 | Process follower | Testing in progress | |||||
| #1727 W394 | Jared design | Lionix | 80-nm core | ||||
| #1727 W395 | Jared design | Lionix | 80-nm core | ||||
| Short Loop 2010 06 | SOIBuffer2R | Process follower | Geza | Testing in progress |
