Difference between revisions of "Device Run"
From OptoelectronicsWiki
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! Project !! Name of mask set !! Mask file !! Mask Polarity and Coordinates !! Process follower !! Process illustration !! Created by !! date !! Note !! Status !! Project page | ! Project !! Name of mask set !! Mask file !! Mask Polarity and Coordinates !! Process follower !! Process illustration !! Created by !! date !! Note !! Status !! Project page | ||
+ | |- | ||
+ | | '''EA modulator''' || EAM11 || tobeupdated ||N/A || [[Media:EAM12_process.xls|download]] || TBU || Yongbo ||APR, 2012|| EAM/Segmented || done || [[Modulator]]; | ||
|- | |- | ||
| '''SWEEPER''' || || || N/A ||[[media:110202_Sweeper_Rev1_Batch_1.xls|download]] || [[media:SWEEPER_process_flow.pptx|download]] ||Jon ||May, 2011|| || In progress || [[SWEEPER]]; | | '''SWEEPER''' || || || N/A ||[[media:110202_Sweeper_Rev1_Batch_1.xls|download]] || [[media:SWEEPER_process_flow.pptx|download]] ||Jon ||May, 2011|| || In progress || [[SWEEPER]]; |
Revision as of 09:19, 1 April 2012
- Please contribute your mask layout and process follower here.
- This page is used to help everyone get track of the mask sets and related process files.
- Note there are two tables
Project | Name of mask set | Mask file | Mask Polarity and Coordinates | Process follower | Process illustration | Created by | date | Note | Status | Project page |
---|---|---|---|---|---|---|---|---|---|---|
EA modulator | EAM11 | tobeupdated | N/A | download | TBU | Yongbo | APR, 2012 | EAM/Segmented | done | Modulator; |
SWEEPER | N/A | download | download | Jon | May, 2011 | In progress | SWEEPER; | |||
PhASER | PhASER rev1 | download | N/A | download | download | Hui-Wen | JUN, 2008 | done | ||
PhASER rev2 | download | download | download | download | Hui-Wen | AUG, 2009 | Spiral delay lines | done | PhASER; | |
Mach-Zehnder modulator | MZM rev2 | download | download | download | download | Hui-Wen | APR, 2010 | slotline design rev2 | done | |
EA modulator | EAM10 | download | N/A | download | download | Yongbo | APR, 2010 | EAM/TW/Segmented | done | Modulator; |
High power MLL | HP-MLL rev1 | download | N/A | download | download | Mike | Dec 2010 | in progress | High-power MLL; | |
AWG receiver | AWG receiver rev.1 | download | download | download | 2009 | in progress | AWG Receiver; | |||
Super Lattice | download | download | download | Hui-Wen | Oct, 2009 | Superlattice |
Run ID | wafer | mask | process flow | process follower | operator | logbook | results |
---|---|---|---|---|---|---|---|
SOIBuffer2R 1 | Summary of data. | ||||||
SOIBuffer2R 2 | Grass during mesa etch. New batch started. | ||||||
SOIBuffer2R 3 | Negative PR residue over III-V couldn't be cleaned off. Process follower adjusted. | ||||||
SOIBuffer2R 4 | Process follower | Testing in progress | |||||
#1727 W394 | Jared design | Lionix | 80-nm core | ||||
#1727 W395 | Jared design | Lionix | 80-nm core | ||||
Short Loop 2010 06 | SOIBuffer2R | Process follower | Geza | Testing in progress |