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descDate Name Thumbnail Size User Description Versions
09:12, 10 September 2012 9 7 DUV SOI 170 1 Sidewalls.zip (file) 2.64 MB Jaredhulme Sidewall profiles of silicon wafer on best resolution and energy, ie Res = -.15 Energy = 25mJ/cm^2 1
09:14, 6 September 2012 SWEEPER 3 1 - aSi Shortloop v12B (EBL incl).zip (file) 34.22 MB JKD   1
11:10, 5 September 2012 Lab guidelines NOV2010.pdf (file) 569 KB Molly   2
16:55, 4 September 2012 8 31 DUV SOI 170C 1.zip (file) 1.47 MB Jaredhulme More SEMs of the SOI wafer Focus/Energy matrix. 1
12:39, 28 August 2012 EAM11 implantation.zip (file) 768 KB Yongbo   2
12:36, 28 August 2012 EAM11 ARCoating.zip (file) 60 KB Yongbo   1
12:30, 28 August 2012 EAM11 mask overview.pptx (file) 216 KB Yongbo   1
12:09, 28 August 2012 EAM11 mask map.pptx (file) 347 KB Yongbo   1
11:36, 28 August 2012 DUV Stepper Waveguides v5.pptx (file) 30.88 MB Jaredhulme   1
10:46, 28 August 2012 8 28 DUV SOI 170C 1.zip (file) 1.89 MB Jaredhulme SOI wafer with matrix array. SEMs are named as E25_F-.15_HGRT, where 'E' stands for the energy in mJ/cm^2 and 'F' for the focus. Energy 25mJ/cm^2, Focus -.15 seems to be a good configuration. 1
10:42, 27 August 2012 POEMv1Sim.zip (file) 170 KB Yongbo   1
09:46, 27 August 2012 SOI 500nm 1000nm spec.pdf (file) 37 KB Yongbo   1
09:42, 27 August 2012 POEMv1Code.zip (file) 10 KB Yongbo   2
09:39, 27 August 2012 POEMv1Final.zip (file) 15.31 MB Yongbo   1
12:52, 23 August 2012 Wavelength scan.zip (file) 34 KB Sudharsanan   1
10:20, 23 August 2012 8 23 DUV SOI 170C 1.zip (file) 1.34 MB Jaredhulme SOI wafer with matrix array. SEMs are named as E25_F-.15_HGRT, where 'E' stands for the energy in mJ/cm^2 and 'F' for the focus. It appears that the focus needs to be more negative than the current array. More SEMs are needed for conclusive proof. 1
12:56, 22 August 2012 Post5and10minetchsu8.zip (file) 1.96 MB Jaredhulme Looks ok but hard to tell if completely gone. I still need to do the last 30 SiN etch. Measurements over large window was 2.51 um with resist, 2.40 um post 5 min etch (resist gone), 2.38 um post another 5 min etch. 1
12:52, 22 August 2012 Via2Litho.zip (file) 495 KB Jaredhulme Notice the rounding at the top of the resist after the 10min 120C bake. 1
12:45, 22 August 2012 NMetal Litho.zip (file) 3.1 MB Jaredhulme Pictures of NMetal litho. Note the shifted alignment (at this and previous layers) on the serpentine waveguides vs the equal alignment on the straight waveguides. 1
12:39, 22 August 2012 Liftoff Results.zip (file) 3.26 MB Jaredhulme The test wafers with metal dep from yesterday ( 0.9 and 1.8 um resist) lifting off this morning with a pipet. Tey were soaked overnight in Acetone and no U/S. Still areas of large flaps but good enough to proceed with the dummy chip. The 0.9 um resist l 1
10:13, 17 August 2012 DUV Stepper Waveguides v4.pptx (file) 26.99 MB Jaredhulme   1
10:12, 17 August 2012 DUV Stepper Waveguides v3.pptx (file) 23.26 MB Jaredhulme   1
10:11, 17 August 2012 DUV Stepper Waveguides v2.pptx (file) 23.11 MB Jaredhulme   1
10:10, 17 August 2012 DUV Stepper Waveguides v1.pptx (file) 4.84 MB Jaredhulme   1
08:54, 17 August 2012 DUV si 170C 2.jpg (file) 225 KB Jaredhulme Microscope picture of the sample. Flood exposed before etch, developed after etch (AZ300MIF) 1
08:50, 17 August 2012 DUV-si-170C-1.zip (file) 1.88 MB Jaredhulme SEMs of sample after WG etch and PR strip -PE2 2min, 1165 soak 30min, 1165 U/S (high, freq5, int5) 10 min, PE2 2min 1
21:09, 14 August 2012 POEMv1ForReview.zip (file) 2.69 MB Yongbo   2
12:51, 14 August 2012 160c 8 6 12.zip (file) 3.8 MB Jaredhulme Silicon wafer - DBARC bake temperature 160C 1
12:50, 14 August 2012 180c 8 6 12.zip (file) 4.61 MB Jaredhulme Silicon wafer - DBARC bake temperature 180C 1
12:48, 14 August 2012 180c 8 4 12.zip (file) 2.9 MB Jaredhulme Silicon wafer - DBARC bake temperature 180C 1
12:48, 14 August 2012 170c 8 4 12.zip (file) 2.18 MB Jaredhulme Silicon wafer - DBARC bake temperature 170C 1
11:00, 14 August 2012 Post 1050C anneal pics.zip (file) 2.93 MB Jaredhulme   2
09:51, 14 August 2012 Failed contact Litho.zip (file) 2.95 MB Jaredhulme Contact lithography, post SPR955CM-1.8 develop. Contact metal pad separation is 1um in some places and is getting undercut during the develop. This leads to strings of resist shifting position. 1
09:35, 14 August 2012 Dummy2 SEM post si etch.zip (file) 3.02 MB Jaredhulme SEMs of Dummy 2, post silicon rib etch 1
14:07, 13 August 2012 POEMv1.pptx (file) 157 KB Yongbo   1
13:43, 10 August 2012 Post 20min NanoStrip 8 10 12.zip (file) 542 KB Jaredhulme   1
09:32, 10 August 2012 Via1 Etch PR Stripped.zip (file) 200 KB Jaredhulme   1
09:32, 10 August 2012 Via 1 litho pics.zip (file) 2.67 MB Jaredhulme   1
09:22, 10 August 2012 Via1 litho pics.zip (file) 2.3 MB Jaredhulme   1
15:47, 9 August 2012 KeyFinderInstaller.rar (file) 1,017 KB Jock   1
00:56, 9 August 2012 DUV Stepper Waveguides Development.pptx (file) 23.26 MB Jock   3
17:27, 6 August 2012 DUV Stepper Waveguides 2.pptx (file) 23.11 MB Jaredhulme   1
16:35, 6 August 2012 Cracking Pics post 3C Strip 1.jpg (file) 3.05 MB Jaredhulme   1
16:28, 6 August 2012 Cracking Pics post 3C Strip .jpg (file) 3.06 MB Jaredhulme   1
13:49, 6 August 2012 Post imp3B PR strip.jpg (file) 165 KB Jaredhulme   1
13:35, 6 August 2012 Implant3C litho.zip (file) 994 KB Jaredhulme   1
08:43, 5 August 2012 SWEEPER 3 1 - aSi Shortloop v12.zip (file) 33.55 MB JKD zipped .cif file 1
08:41, 5 August 2012 SWEEPER 3 1 - aSi Shortloop v12.cif (file) 33.55 MB JKD   1
16:08, 2 August 2012 Silicon Photonics The State of the Art - Graham Reed.rar (file) 24.9 MB Jock   1
16:08, 2 August 2012 Silicon Photonics An Introduction - Graham Reed.rar (file) 1.63 MB Jock   1

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