File list
From OptoelectronicsWiki
This special page shows all uploaded files.
 Date |
Name | Thumbnail | Size | User | Description | Versions |
|---|---|---|---|---|---|---|
| 11:40, 9 February 2012 | KeithleySetVoltage.txt (file) |  |
873 B | Jaredhulme | 1 | |
| 11:48, 9 February 2012 | KeithleySetCurrent.txt (file) | |
868 B | Jaredhulme | 2 | |
| 09:37, 9 April 2012 | Planarization Study.pptx (file) |  |
72 KB | Jaredhulme | 3 | |
| 09:41, 9 April 2012 | Run2 Pics.pptx (file) | |
21.92 MB | Jaredhulme | 1 | |
| 15:28, 27 April 2012 | UniformityDektakData.xlsx (file) | |
287 KB | Jaredhulme | Dektak data for BCB planarization study. These were performed using taper masks and show the distances from the BCB to the top of the mesa after ashing back the BCB. | 1 |
| 07:24, 6 June 2012 | BCB Short Loop Process Follower.pptx (file) | |
692 KB | Jaredhulme | Short loop process designed to test BCB in conditions near the actual design. | 1 |
| 07:26, 6 June 2012 | BCB Short Loop Process Follower PDF.pdf (file) |  |
841 KB | Jaredhulme | 1 | |
| 10:37, 12 July 2012 | Hybrid Silicon Process Follower - v1.2.xlsx (file) | |
48 KB | Jaredhulme | Automatic step numbering | 4 |
| 10:33, 18 July 2012 | Dummy post pr strip pre rib etch.zip (file) | |
354 KB | Jaredhulme | 1 | |
| 10:33, 18 July 2012 | Sample1 pre si etch.zip (file) | |
886 KB | Jaredhulme | 1 | |
| 10:33, 18 July 2012 | Sample2 pre si etch.zip (file) | |
491 KB | Jaredhulme | 1 | |
| 13:32, 18 July 2012 | Sample2 post si etch.zip (file) | |
453 KB | Jaredhulme | 1 | |
| 14:19, 18 July 2012 | SWEEPER Actives Trav v21 1 ACTIVE SI ONLY.docx (file) | |
65 KB | Jaredhulme | 1 | |
| 09:15, 23 July 2012 | Sample2 SEM post si etch.zip (file) | |
3.02 MB | Jaredhulme | 2 | |
| 16:24, 24 July 2012 | Ndopelithopics.zip (file) | |
3.34 MB | Jaredhulme | 1 | |
| 14:02, 30 July 2012 | Post imp3A PR strip.zip (file) | |
1.92 MB | Jaredhulme | 1 | |
| 14:02, 30 July 2012 | Implant3B litho.zip (file) | |
675 KB | Jaredhulme | 1 | |
| 15:27, 1 August 2012 | SEM Gratings 8 1 12.pptx (file) | |
3.56 MB | Jaredhulme | 1 | |
| 16:52, 1 August 2012 | SEM Gratings 8 1 12.zip (file) | |
1.3 MB | Jaredhulme | 1 | |
| 11:22, 2 August 2012 | DUV Stepper Waveguides 1.pptx (file) | |
4.84 MB | Jaredhulme | 2 | |
| 13:35, 6 August 2012 | Implant3C litho.zip (file) | |
994 KB | Jaredhulme | 1 | |
| 13:49, 6 August 2012 | Post imp3B PR strip.jpg (file) |  |
165 KB | Jaredhulme | 1 | |
| 16:28, 6 August 2012 | Cracking Pics post 3C Strip .jpg (file) |  |
3.06 MB | Jaredhulme | 1 | |
| 16:35, 6 August 2012 | Cracking Pics post 3C Strip 1.jpg (file) |  |
3.05 MB | Jaredhulme | 1 | |
| 17:27, 6 August 2012 | DUV Stepper Waveguides 2.pptx (file) | |
23.11 MB | Jaredhulme | 1 | |
| 09:22, 10 August 2012 | Via1 litho pics.zip (file) | |
2.3 MB | Jaredhulme | 1 | |
| 09:32, 10 August 2012 | Via 1 litho pics.zip (file) | |
2.67 MB | Jaredhulme | 1 | |
| 09:32, 10 August 2012 | Via1 Etch PR Stripped.zip (file) | |
200 KB | Jaredhulme | 1 | |
| 13:43, 10 August 2012 | Post 20min NanoStrip 8 10 12.zip (file) | |
542 KB | Jaredhulme | 1 | |
| 09:35, 14 August 2012 | Dummy2 SEM post si etch.zip (file) | |
3.02 MB | Jaredhulme | SEMs of Dummy 2, post silicon rib etch | 1 |
| 09:51, 14 August 2012 | Failed contact Litho.zip (file) | |
2.95 MB | Jaredhulme | Contact lithography, post SPR955CM-1.8 develop. Contact metal pad separation is 1um in some places and is getting undercut during the develop. This leads to strings of resist shifting position. | 1 |
| 11:00, 14 August 2012 | Post 1050C anneal pics.zip (file) | |
2.93 MB | Jaredhulme | 2 | |
| 12:48, 14 August 2012 | 170c 8 4 12.zip (file) | |
2.18 MB | Jaredhulme | Silicon wafer - DBARC bake temperature 170C | 1 |
| 12:48, 14 August 2012 | 180c 8 4 12.zip (file) | |
2.9 MB | Jaredhulme | Silicon wafer - DBARC bake temperature 180C | 1 |
| 12:50, 14 August 2012 | 180c 8 6 12.zip (file) | |
4.61 MB | Jaredhulme | Silicon wafer - DBARC bake temperature 180C | 1 |
| 12:51, 14 August 2012 | 160c 8 6 12.zip (file) | |
3.8 MB | Jaredhulme | Silicon wafer - DBARC bake temperature 160C | 1 |
| 08:50, 17 August 2012 | DUV-si-170C-1.zip (file) | |
1.88 MB | Jaredhulme | SEMs of sample after WG etch and PR strip -PE2 2min, 1165 soak 30min, 1165 U/S (high, freq5, int5) 10 min, PE2 2min | 1 |
| 08:54, 17 August 2012 | DUV si 170C 2.jpg (file) |  |
225 KB | Jaredhulme | Microscope picture of the sample. Flood exposed before etch, developed after etch (AZ300MIF) | 1 |
| 10:10, 17 August 2012 | DUV Stepper Waveguides v1.pptx (file) | |
4.84 MB | Jaredhulme | 1 | |
| 10:11, 17 August 2012 | DUV Stepper Waveguides v2.pptx (file) | |
23.11 MB | Jaredhulme | 1 | |
| 10:12, 17 August 2012 | DUV Stepper Waveguides v3.pptx (file) | |
23.26 MB | Jaredhulme | 1 | |
| 10:13, 17 August 2012 | DUV Stepper Waveguides v4.pptx (file) | |
26.99 MB | Jaredhulme | 1 | |
| 12:39, 22 August 2012 | Liftoff Results.zip (file) | |
3.26 MB | Jaredhulme | The test wafers with metal dep from yesterday ( 0.9 and 1.8 um resist) lifting off this morning with a pipet. Tey were soaked overnight in Acetone and no U/S. Still areas of large flaps but good enough to proceed with the dummy chip. The 0.9 um resist l | 1 |
| 12:45, 22 August 2012 | NMetal Litho.zip (file) | |
3.1 MB | Jaredhulme | Pictures of NMetal litho. Note the shifted alignment (at this and previous layers) on the serpentine waveguides vs the equal alignment on the straight waveguides. | 1 |
| 12:52, 22 August 2012 | Via2Litho.zip (file) | |
495 KB | Jaredhulme | Notice the rounding at the top of the resist after the 10min 120C bake. | 1 |
| 12:56, 22 August 2012 | Post5and10minetchsu8.zip (file) | |
1.96 MB | Jaredhulme | Looks ok but hard to tell if completely gone. I still need to do the last 30 SiN etch. Measurements over large window was 2.51 um with resist, 2.40 um post 5 min etch (resist gone), 2.38 um post another 5 min etch. | 1 |
| 10:20, 23 August 2012 | 8 23 DUV SOI 170C 1.zip (file) | |
1.34 MB | Jaredhulme | SOI wafer with matrix array. SEMs are named as E25_F-.15_HGRT, where 'E' stands for the energy in mJ/cm^2 and 'F' for the focus. It appears that the focus needs to be more negative than the current array. More SEMs are needed for conclusive proof. | 1 |
| 10:46, 28 August 2012 | 8 28 DUV SOI 170C 1.zip (file) | |
1.89 MB | Jaredhulme | SOI wafer with matrix array. SEMs are named as E25_F-.15_HGRT, where 'E' stands for the energy in mJ/cm^2 and 'F' for the focus. Energy 25mJ/cm^2, Focus -.15 seems to be a good configuration. | 1 |
| 11:36, 28 August 2012 | DUV Stepper Waveguides v5.pptx (file) | |
30.88 MB | Jaredhulme | 1 | |
| 16:55, 4 September 2012 | 8 31 DUV SOI 170C 1.zip (file) | |
1.47 MB | Jaredhulme | More SEMs of the SOI wafer Focus/Energy matrix. | 1 |
 First page |
 Previous page |
 Next page |
 Last page |
